Pub – Microlithography

1. "A Positive, Chemically-Amplified Aromatic Methacrylate Resist Employing the Tetrahyddropyranyl Protecting Group", Chem. Mater. 1991, 3, 1031. [ with Taylor, G. N., Stillwagon, L. E., Houlihan, F. M., Wolf, T. M., Hertler, W. R.]

2. "A Positive, Chemically-Amplified Aromatic Methacrylate Resist Employing the Tetrahyddropyranyl Protecting Group", J. Vac. Sci. Tech. 1991, B9, 3348. [ with Taylor, G. N., Stillwagon, L. E., Houlihan, F. M., Wolf, T. M., Hertler, W. R.]

3. Hertler, W. R.; Sogah, D. Y.; Raymond, F. A.; Bauer, R. D.; Chang, C. T.; Taylor, G. N.; and Stillwagon, L. E. "Synthesis and Applications of Acid-Labile Acrylic Polymers", Makromol. Chem., Macromol. Symp. 1992, 64, 137-149.

US PATENTS

1. Resist Material and Process For Use, US 5,212,047 (1993)

2. Resist Material and Process For Use, US 5,206,317 (1993)